Vantage Technology Corporation
is an emerging leader in the micro-analytical test and measurement field. Our products enable real-time control of the chemical-mechanical planarization process (CMP) during semiconductor manufacturing. more
Come to this year's ICPT conference and join Dr. Jonathan Bennett of IMFT as he presents "Correlation of Large Particle Count Data in CMP Slurry with Production Wafer Defects"
November 19-21, 2014, Kobe, Japan
Dr. Michael Fury of Vantage Technology recently presented Field Validation of Sub-Micron Defect Correlation ≥ 1 Micron Particle Behavior in Undiluted POU CMP Slurry at the Korea CMP User Group meeting
October 30, 2014, Sungkyunkwan University, Korea
Vantage Technology recently participated in Sematech's quarterly CMP Equipment Productivity Forum (EPF)
October 21-23, 2014, Albany, New York