Vantage Technology Corporation
is an emerging leader in the micro-analytical test and measurement field. Our products enable real-time control of the chemical-mechanical planarization process (CMP) during semiconductor manufacturing. more
Vantage Technology will be participating in Sematech's quarterly CMP Equipment Productivity Forum (EPF)
October 21-23, 2014, Albany, New York
Dr. Michael Fury of Vantage Technology will be presenting "Field Validation of Sub-Micron Defect Correlation ≥ 1 Micron Particle Behavior in Undiluted POU CMP Slurry" at the upcoming Korea CMP User Group meeting
October 30, 2014, Sungkyunkwan University, Korea
Come to this year's ICPT conference and join Dr. Jonathan Bennett of IMFT as he presents "Correlation of Large Particle Count Data in CMP Slurry with Production Wafer Defects"
November 19-21, 2014, Kobe, Japan